The favorable outcomes of dental implant rehabilitation are predominantly rooted in the creation and long-term preservation of an osseointegrated junction between bone and implant. Multiple variables shape the formation of this junction, among which the implant thread architecture exerts a paramount influence. The objective of this work is to examine how thread depth, assessed across four separate thread configurations, affects stress distribution at the bone-implant boundary using three-dimensional finite element modeling. Four distinct implant geometries were engineered, differing in thread profile—V thread, square thread, buttress thread, and reverse buttress thread—each standardized to a thread depth of 0.4 mm. These geometrical representations were virtually inserted into the mandibular first molar site. Loading was delivered at 100 N along the implant’s long axis and obliquely at a 45° inclination. The resultant Von Mises stresses were quantified around the implant–bone contact zone and evaluated across the different configurations. The resultant color-coded stress maps were inspected, and the highest Von Mises stress values were extracted and systematically tabulated for every loading state. Stress dispersal in the computational models is displayed both as numerical outputs and via color gradients. Peak Von Mises stress magnitudes correspond to the red end of the spectrum, whereas minima appear as blue. Intermediate intensities are sequentially represented by bluish green, green, greenish yellow, and yellowish red as stress levels rise. Thread architecture is a critical determinant of stress distribution throughout the implant and adjacent bone. Distinct Von Mises stress magnitudes manifest at the interface zones of cortical bone-implant and cancellous bone-implant. For implant longevity, sound osseointegration is indispensable, and thread geometry is a pivotal contributor. Hence, selecting fixtures with an optimal thread pattern significantly improves the prognosis of an implant-retained restoration.
